Latest technology improvements deliver unprecedented measurement accuracy and robustness for advanced semiconductor manufacturing
AUSTIN, Texas–(BUSINESS WIRE)–Fractilia, LLC, the leader in stochastics metrology and control solutions for advanced semiconductor manufacturing, today announced the release of Version 5.0 of its product suite featuring the debut of Generation 5 of the company’s patented Fractilia Inverse Linescan Model (FILM™) technology.
FILM is a proprietary, physics-based model of how a scanning electron microscope (SEM) captures an image. It enables Fractilia’s products to measure SEM images without any image filtering, delivering the industry’s highest signal-to-noise ratio and measurement accuracy. The company holds more than 20 patents and hundreds of trade secrets on the technology.
Generation 5 FILM introduces:
- Highest measurement accuracy and precision ever achieved in stochastics metrology
- Most robust performance across the widest range of metrology and process conditions, including out-of-focus, low contrast, and through focus/dose scenarios—capabilities especially critical for high-NA EUV processes
- Expanded measurement coverage for more feature types and layout configurations
Other new Version 5.0 capabilities include:
- Fully automated bad image exclusion based on customer-defined criteria
- Enhanced measurement options using GDS/OASIS feature layouts
- Support for additional feature types, plus expanded contact hole and line/space measurements
“With Generation 5 of FILM, we are pushing metrology performance to new heights,” said Edward Charrier, CEO of Fractilia. “Our customers are facing unprecedented stochastic variability challenges at advanced nodes, and these new capabilities ensure they can measure and control those effects with unmatched accuracy and confidence.”
“This is a significant leap forward in our FILM technology,” added Chris Mack, CTO of Fractilia. “By combining extreme measurement precision with industry leading robustness across process and metrology conditions, Generation 5 FILM enables fabs to improve metrology across the board, as well as extend process control deeper into the High-NA EUV era.”
Alignment with Industry Momentum
While the Version 5.0 release marks a substantial increase in functionality, it also is part of Fractilia’s planned three-per-year cadence of regular product suite updates, ensuring customers benefit from continuous performance improvements.
Generation 5 FILM, follows Fractilia’s recent Closing the Stochastics Resolution Gap whitepaper release, which quantified how uncontrolled random patterning variations can cost advanced-node fabs hundreds of millions of dollars annually in lost yield, and outlined a roadmap for closing that gap through measurement, design, and process innovations.
SEMICON Taiwan, Taipei, September 9 – 12, 2025
On Tuesday, September 9 at SEMICON Taiwan, one of the most respected voices in semiconductor lithography, Dr. Chris Mack, Fractilia’s CTO, will be presenting Closing the Stochastic Resolution Gap. The presentation will offer a new perspective on the problem of stochastics by analyzing it through the lens of resolution. Dr. Mack will explore how these techniques, when backed by accurate metrology, can improve yield, performance, and reliability at advanced process nodes.
- Tuesday, September 9th, IC Forum – Advance Chip Technology and Manufacturing session
- 15:30 pm – 15:50 pm: Closing the Stochastic Resolution Gap
Attendees can learn more about FILM and the company’s cutting-edge solutions for addressing the industry’s most pressing patterning challenge – random stochastic variability at advanced nodes – in the Standard Technology Corporation (STC) at Booth MO134 at SEMICON Taiwan, September 10-11.
About Fractilia
Fractilia is the world leader in stochastics metrology and control solutions for advanced semiconductor manufacturing. Its patented FILM™ technology provides highly accurate and precise measurements of stochastics—the single largest source of patterning errors at advanced nodes—helping customers improve yield, performance, and productivity. Fractilia’s solutions include MetroLER™ for process development and engineering analysis, and the FAME™ family for fab ramp and production applications. Headquartered in Austin, Texas, Fractilia holds more than 20 issued patents. For more information, visit www.fractilia.com.
Contacts
Media Contact:
Michelle Clancy Fuller
Cayenne Global
[email protected]
+1 503.702.4732
